Precision Guardian of Semiconductor Wafer Manufacturing: Application Case of SJG-2083CS Inductive Acid-Base Concentration Meter in Hydrofluoric Acid Detection

I. Industry Pain Points and Client Requirements

In semiconductor wafer manufacturing, hydrofluoric acid (HF) serves as a critical etching and cleaning reagent, where concentration accuracy directly impacts chip yield and process stability. A leading semiconductor manufacturer faced three key challenges with traditional HF concentration detection methods in its 12-inch wafer wet etching process:

• Insufficient Precision: Titration-based manual sampling resulted in a detection error of ±2%, causing HF concentration fluctuations to exceed SEMI C8 standards (±0.5%). This led to poor silicon wafer etching uniformity and a yield rate of only 82%.
• Corrosion Risks: Contact electrodes were prone to HF corrosion, requiring 3 sensor replacements monthly at a maintenance cost exceeding RMB 12,000/year.
• Response Lag: Offline detection took 40 minutes, delaying real-time adjustment of etchant. A single process anomaly caused 50 wafers to be scrapped, resulting in losses over RMB 200,000.

To address these issues, the client urgently needed ahigh-precision, corrosion-resistant, real-time onlineHF concentration monitoring device with requirements including a measurement range of 0-5% HF (for diluted etchant), precision ≤±0.1% FS, and compliance with SEMI S2 safety standards.

II. Solution and Technological Innovation

The client ultimately selected 50 units of the SJG-2083CS Inductive Acid-Base Concentration Meter, whose core advantages perfectly aligned with semiconductor process needs:

• Non-Contact Measurement: Utilizing electromagnetic induction principles, PFA material electrodes are fully isolated from HF solutions, with a temperature resistance range of -40℃~100℃. Service life extended to 2 years, reducing maintenance costs by 90%.
• High Precision and Stability: Equipped with dual-channel AD conversion technology, resolution of 0.01%, and automatic temperature compensation (0~100℃), ensuring concentration detection error ≤±0.05%—exceeding the client’s ±0.1% requirement.
• Real-Time Data Closed-Loop: Integrated with the PLC system via Modbus RTU protocol, with a detection frequency of 1 reading/second. When HF concentration deviates from the set range (e.g., target 2.5%±0.1%), the system automatically triggers fluid rehydration devices with a response time <10 seconds.
• Compliance Assurance: CE-certified with electrode materials meeting FDA 21 CFR Part 177 standards, satisfying strict requirements for SEMI G5-grade HF (metal impurities ≤0.01ppb).

Parameters of SJG-2083CS Inductive Acid Alkali Concentration Meter

III. Application Outcomes and Quantitative Value

Six months after deployment, significant improvements were achieved on the client’s production line:

• Yield Breakthrough: HF concentration fluctuation was controlled within ±0.08%, reducing wafer etching line width deviation from ±0.3μm to ±0.1μm. Yield rate increased to 92%, reducing annual scrap losses by approximately RMB 4.8 million.
• Efficiency Gains: Real-time monitoring replaced manual sampling, cutting detection time from 40 minutes to 1 second. Daily labor hours saved by 3 hours, with annual labor cost savings of RMB 250,000.
• Regulatory Compliance: Successfully passed third-party audits for SEMI C12 standards, with traceable data meeting ISO 14644-1 Class 5 cleanroom requirements.
• Safety Upgrades: Non-contact design eliminated HF leakage risks, with IP65 explosion-proof rating. Zero safety incidents in six months raised safety audit scores from 85 to 98.

IV. Client Testimonial and Industry Value

The semiconductor manufacturer’s Process Director stated: “The stability of SJG-2083CS exceeded expectations. It enabled real-time closed-loop control of HF concentration, significantly improving yield and marking a key step in our localization of semiconductor materials.”

This case demonstrates SJG-2083CS’s technical advantages inhigh-precision chemical monitoring, offering reliable concentration control solutions for high-end manufacturing industries such as semiconductors and photovoltaics. Its non-contact measurement and low maintenance features empower enterprises to achieve sustainable development goals ofquality improvement, cost reduction, and efficiency enhancement.